Intern: Photolithography Process Dev & Overlay Modeling

Micron Technology in Singapore is seeking a candidate for a project focused on Edge Placement Error Modeling and Optimization in photolithography. The role involves developing and optimizing models for overlay and critical dimension uniformity improvement. Candidates should have strong mathematical modeling skills, programming knowledge, and familiarity with characterization techniques like SEM and optical imaging. This position is for a duration of 4-6 months, offering an opportunity to work with cutting-edge semiconductor manufacturing technologies.
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