Intern - Photolithography Process Development

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Location: Fab10N Singapore
Department: Process Development – Singapore (Photolithography)
Project title: Edge Placement Error Modeling and Optimization
Project Description:
Develop and optimize models for overlay and critical dimension uniformity improvement
Project scope: Introduction to photolithography for semiconductor patterning and control with
Deliverable:
develop and deploy edge placement error model for photolithography
Skillset...