Intern - Photolithography Process Development

Micron Technology • singapore, singapore, Singapore • Posted June 18, 2026

Location singapore, singapore

Job Type Full-time

Category Other-General

Posted June 18, 2026

Overview Location: Fab10N Singapore 
Department: Process Development – Singapore (Photolithography) 
Project title: Edge Placement Error Modeling and Optimization 
Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control. 
Deliverables Develop and deploy edge placement error model for photolithography 
Skillset Required Mathematical modeling and numerical analysis with programming knowledge (preferred) 
Characterization techniques: SEM, optical imaging 
Course Of Interest Semiconductor Manufacturing 
Nanomaterials 
Physics 
Mathematical modeling 
Programming 
Duration 4-6 months (minimum 4 months) 
About the Company We are an industry leader in innovative me...
            

Interested in this role?

Click the button below to start your application.

Apply Now